si3n4 membrane Search Results


a si3n4 mesh  (Plano gmbh)
90
Plano gmbh a si3n4 mesh
A Si3n4 Mesh, supplied by Plano gmbh, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/result/a si3n4 mesh/product/Plano gmbh
Average 90 stars, based on 1 article reviews
a si3n4 mesh - by Bioz Stars, 2026-02
90/100 stars
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si3n4 membrane  (Silson Ltd)
90
Silson Ltd si3n4 membrane
Si3n4 Membrane, supplied by Silson Ltd, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/result/si3n4 membrane/product/Silson Ltd
Average 90 stars, based on 1 article reviews
si3n4 membrane - by Bioz Stars, 2026-02
90/100 stars
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si 3 n 4 membrane  (Silson Ltd)
90
Silson Ltd si 3 n 4 membrane
Si 3 N 4 Membrane, supplied by Silson Ltd, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/result/si 3 n 4 membrane/product/Silson Ltd
Average 90 stars, based on 1 article reviews
si 3 n 4 membrane - by Bioz Stars, 2026-02
90/100 stars
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400 nm thick silicon dioxide (sio2) membranes with hexagonally packed 3 lm holes spaced 9 lm apart  (SiMPore Inc)
90
SiMPore Inc 400 nm thick silicon dioxide (sio2) membranes with hexagonally packed 3 lm holes spaced 9 lm apart
400 Nm Thick Silicon Dioxide (Sio2) Membranes With Hexagonally Packed 3 Lm Holes Spaced 9 Lm Apart, supplied by SiMPore Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/result/400 nm thick silicon dioxide (sio2) membranes with hexagonally packed 3 lm holes spaced 9 lm apart/product/SiMPore Inc
Average 90 stars, based on 1 article reviews
400 nm thick silicon dioxide (sio2) membranes with hexagonally packed 3 lm holes spaced 9 lm apart - by Bioz Stars, 2026-02
90/100 stars
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tem grid (ted pella, 21530-10)  (Ted Pella)
90
Ted Pella tem grid (ted pella, 21530-10)
Tem Grid (Ted Pella, 21530 10), supplied by Ted Pella, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/result/tem grid (ted pella, 21530-10)/product/Ted Pella
Average 90 stars, based on 1 article reviews
tem grid (ted pella, 21530-10) - by Bioz Stars, 2026-02
90/100 stars
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monolayer graphene samples on holey si 3 n 4 tem membranes  (Ted Pella)
90
Ted Pella monolayer graphene samples on holey si 3 n 4 tem membranes
Tuning the laser condition via ( a ) irradiance, ( b ) pulse width, and ( c ) frequency to realize the transition between carbon deposition and He + milling <t>of</t> <t>monolayer</t> <t>graphene.</t> Constant linear He + beam scans with the length of 400 nm and the dose of 2 × 10 5 ions/nm were used. The typical width of the carbon deposit and cut lines are 55 nm and 40 nm, respectively. The laser pulse width and frequency were set at 10 µs and 100 Hz, respectively, for the irradiance test shown in ( a ); the irradiance and frequency were set at 29 kW/cm 2 and 100 Hz, respectively, for the pulse width test in ( b ); the irradiance and pulse width were set at 29 kW/cm 2 and 10 µs, respectively, for the frequency test in ( c ); and ( d ) plots the average laser power density and energy density per pulse. Dashed lines mark the threshold values between depositions and mills.
Monolayer Graphene Samples On Holey Si 3 N 4 Tem Membranes, supplied by Ted Pella, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/result/monolayer graphene samples on holey si 3 n 4 tem membranes/product/Ted Pella
Average 90 stars, based on 1 article reviews
monolayer graphene samples on holey si 3 n 4 tem membranes - by Bioz Stars, 2026-02
90/100 stars
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15-nm-thick low-stress si3n4 membrane  (Silchem GmbH)
90
Silchem GmbH 15-nm-thick low-stress si3n4 membrane
Tuning the laser condition via ( a ) irradiance, ( b ) pulse width, and ( c ) frequency to realize the transition between carbon deposition and He + milling <t>of</t> <t>monolayer</t> <t>graphene.</t> Constant linear He + beam scans with the length of 400 nm and the dose of 2 × 10 5 ions/nm were used. The typical width of the carbon deposit and cut lines are 55 nm and 40 nm, respectively. The laser pulse width and frequency were set at 10 µs and 100 Hz, respectively, for the irradiance test shown in ( a ); the irradiance and frequency were set at 29 kW/cm 2 and 100 Hz, respectively, for the pulse width test in ( b ); the irradiance and pulse width were set at 29 kW/cm 2 and 10 µs, respectively, for the frequency test in ( c ); and ( d ) plots the average laser power density and energy density per pulse. Dashed lines mark the threshold values between depositions and mills.
15 Nm Thick Low Stress Si3n4 Membrane, supplied by Silchem GmbH, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/result/15-nm-thick low-stress si3n4 membrane/product/Silchem GmbH
Average 90 stars, based on 1 article reviews
15-nm-thick low-stress si3n4 membrane - by Bioz Stars, 2026-02
90/100 stars
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30-nm-thick freestanding si 3 n 4 membranes  (Silson Ltd)
90
Silson Ltd 30-nm-thick freestanding si 3 n 4 membranes
Tuning the laser condition via ( a ) irradiance, ( b ) pulse width, and ( c ) frequency to realize the transition between carbon deposition and He + milling <t>of</t> <t>monolayer</t> <t>graphene.</t> Constant linear He + beam scans with the length of 400 nm and the dose of 2 × 10 5 ions/nm were used. The typical width of the carbon deposit and cut lines are 55 nm and 40 nm, respectively. The laser pulse width and frequency were set at 10 µs and 100 Hz, respectively, for the irradiance test shown in ( a ); the irradiance and frequency were set at 29 kW/cm 2 and 100 Hz, respectively, for the pulse width test in ( b ); the irradiance and pulse width were set at 29 kW/cm 2 and 10 µs, respectively, for the frequency test in ( c ); and ( d ) plots the average laser power density and energy density per pulse. Dashed lines mark the threshold values between depositions and mills.
30 Nm Thick Freestanding Si 3 N 4 Membranes, supplied by Silson Ltd, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/result/30-nm-thick freestanding si 3 n 4 membranes/product/Silson Ltd
Average 90 stars, based on 1 article reviews
30-nm-thick freestanding si 3 n 4 membranes - by Bioz Stars, 2026-02
90/100 stars
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microporous si3n4 membrane  (Nasco)
90
Nasco microporous si3n4 membrane
Tuning the laser condition via ( a ) irradiance, ( b ) pulse width, and ( c ) frequency to realize the transition between carbon deposition and He + milling <t>of</t> <t>monolayer</t> <t>graphene.</t> Constant linear He + beam scans with the length of 400 nm and the dose of 2 × 10 5 ions/nm were used. The typical width of the carbon deposit and cut lines are 55 nm and 40 nm, respectively. The laser pulse width and frequency were set at 10 µs and 100 Hz, respectively, for the irradiance test shown in ( a ); the irradiance and frequency were set at 29 kW/cm 2 and 100 Hz, respectively, for the pulse width test in ( b ); the irradiance and pulse width were set at 29 kW/cm 2 and 10 µs, respectively, for the frequency test in ( c ); and ( d ) plots the average laser power density and energy density per pulse. Dashed lines mark the threshold values between depositions and mills.
Microporous Si3n4 Membrane, supplied by Nasco, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/result/microporous si3n4 membrane/product/Nasco
Average 90 stars, based on 1 article reviews
microporous si3n4 membrane - by Bioz Stars, 2026-02
90/100 stars
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si 3 n 4 tem membranes 4124sn-ba  (SPI Supplies)
90
SPI Supplies si 3 n 4 tem membranes 4124sn-ba
Tuning the laser condition via ( a ) irradiance, ( b ) pulse width, and ( c ) frequency to realize the transition between carbon deposition and He + milling <t>of</t> <t>monolayer</t> <t>graphene.</t> Constant linear He + beam scans with the length of 400 nm and the dose of 2 × 10 5 ions/nm were used. The typical width of the carbon deposit and cut lines are 55 nm and 40 nm, respectively. The laser pulse width and frequency were set at 10 µs and 100 Hz, respectively, for the irradiance test shown in ( a ); the irradiance and frequency were set at 29 kW/cm 2 and 100 Hz, respectively, for the pulse width test in ( b ); the irradiance and pulse width were set at 29 kW/cm 2 and 10 µs, respectively, for the frequency test in ( c ); and ( d ) plots the average laser power density and energy density per pulse. Dashed lines mark the threshold values between depositions and mills.
Si 3 N 4 Tem Membranes 4124sn Ba, supplied by SPI Supplies, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/result/si 3 n 4 tem membranes 4124sn-ba/product/SPI Supplies
Average 90 stars, based on 1 article reviews
si 3 n 4 tem membranes 4124sn-ba - by Bioz Stars, 2026-02
90/100 stars
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silicon chips thick si 3 n 4 membranes  (Ted Pella)
90
Ted Pella silicon chips thick si 3 n 4 membranes
Tuning the laser condition via ( a ) irradiance, ( b ) pulse width, and ( c ) frequency to realize the transition between carbon deposition and He + milling <t>of</t> <t>monolayer</t> <t>graphene.</t> Constant linear He + beam scans with the length of 400 nm and the dose of 2 × 10 5 ions/nm were used. The typical width of the carbon deposit and cut lines are 55 nm and 40 nm, respectively. The laser pulse width and frequency were set at 10 µs and 100 Hz, respectively, for the irradiance test shown in ( a ); the irradiance and frequency were set at 29 kW/cm 2 and 100 Hz, respectively, for the pulse width test in ( b ); the irradiance and pulse width were set at 29 kW/cm 2 and 10 µs, respectively, for the frequency test in ( c ); and ( d ) plots the average laser power density and energy density per pulse. Dashed lines mark the threshold values between depositions and mills.
Silicon Chips Thick Si 3 N 4 Membranes, supplied by Ted Pella, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/result/silicon chips thick si 3 n 4 membranes/product/Ted Pella
Average 90 stars, based on 1 article reviews
silicon chips thick si 3 n 4 membranes - by Bioz Stars, 2026-02
90/100 stars
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x40-30-2 calibration target  (Xradia Inc)
90
Xradia Inc x40-30-2 calibration target
Tuning the laser condition via ( a ) irradiance, ( b ) pulse width, and ( c ) frequency to realize the transition between carbon deposition and He + milling <t>of</t> <t>monolayer</t> <t>graphene.</t> Constant linear He + beam scans with the length of 400 nm and the dose of 2 × 10 5 ions/nm were used. The typical width of the carbon deposit and cut lines are 55 nm and 40 nm, respectively. The laser pulse width and frequency were set at 10 µs and 100 Hz, respectively, for the irradiance test shown in ( a ); the irradiance and frequency were set at 29 kW/cm 2 and 100 Hz, respectively, for the pulse width test in ( b ); the irradiance and pulse width were set at 29 kW/cm 2 and 10 µs, respectively, for the frequency test in ( c ); and ( d ) plots the average laser power density and energy density per pulse. Dashed lines mark the threshold values between depositions and mills.
X40 30 2 Calibration Target, supplied by Xradia Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/result/x40-30-2 calibration target/product/Xradia Inc
Average 90 stars, based on 1 article reviews
x40-30-2 calibration target - by Bioz Stars, 2026-02
90/100 stars
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Image Search Results


Tuning the laser condition via ( a ) irradiance, ( b ) pulse width, and ( c ) frequency to realize the transition between carbon deposition and He + milling of monolayer graphene. Constant linear He + beam scans with the length of 400 nm and the dose of 2 × 10 5 ions/nm were used. The typical width of the carbon deposit and cut lines are 55 nm and 40 nm, respectively. The laser pulse width and frequency were set at 10 µs and 100 Hz, respectively, for the irradiance test shown in ( a ); the irradiance and frequency were set at 29 kW/cm 2 and 100 Hz, respectively, for the pulse width test in ( b ); the irradiance and pulse width were set at 29 kW/cm 2 and 10 µs, respectively, for the frequency test in ( c ); and ( d ) plots the average laser power density and energy density per pulse. Dashed lines mark the threshold values between depositions and mills.

Journal: Nanomaterials

Article Title: Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns

doi: 10.3390/nano9101394

Figure Lengend Snippet: Tuning the laser condition via ( a ) irradiance, ( b ) pulse width, and ( c ) frequency to realize the transition between carbon deposition and He + milling of monolayer graphene. Constant linear He + beam scans with the length of 400 nm and the dose of 2 × 10 5 ions/nm were used. The typical width of the carbon deposit and cut lines are 55 nm and 40 nm, respectively. The laser pulse width and frequency were set at 10 µs and 100 Hz, respectively, for the irradiance test shown in ( a ); the irradiance and frequency were set at 29 kW/cm 2 and 100 Hz, respectively, for the pulse width test in ( b ); the irradiance and pulse width were set at 29 kW/cm 2 and 10 µs, respectively, for the frequency test in ( c ); and ( d ) plots the average laser power density and energy density per pulse. Dashed lines mark the threshold values between depositions and mills.

Article Snippet: Commercial grade monolayer graphene samples on holey Si 3 N 4 TEM membranes were purchased from Ted Pella (Redding, CA, USA).

Techniques: